EUV Ellipsometry on Mo/Si Multilayers

on Characterization of metal / dielectric multilayers with in - situ ellipsometry

The project was completed on 31 December 2010. In this project, we did simulations for metal/dielectric multilayer structures, their applications as hyperlens for sub-wavelength imaging with resolution beyond diffraction limit, optimized metal (silver) films and started fabrication and characterization of dielectric films with in-situ ellipsometry monitoring the thickness and optical constants....

Spectroscopic ellipsometry of homoepitaxial diamond multilayers and delta-doped structures

The adsorption of prothrombin to phosphatidylserine multilayers quantitated by ellipsometry.

We investigated by means of an automated ellipsometer the adsorption of prothrombin from a buffer solution by multilayers of 14:0/14:0- and 18:1/18:1-phosphatidylserine (PS) stacked on chromium slides. In this instrument thickness and refractive index of the adsorbed phospholipid and proteins are monitored continuously. Two equations are derived to relate the mass of stacked phospholipids and t...

Development and Interfacial Characterization of Co/Mg Periodic Multilayers for the EUV Range

We propose a new system, namely the periodic Co/Mg multilayer system, for optics applications in the EUV range. Close to the Mg L edge, i.e., around a wavelength of 25 nm or a photon energy of 50 eV, a reflectivity of about 43% is measured at 45° for s-polarized radiation. Moreover, it appears that this system is stable over a period of time of three months. The introduction of thin boron carbi...

Magnetic multilayers on nanospheres.

Thin-film technology is widely implemented in numerous applications. Although flat substrates are commonly used, we report on the advantages of using curved surfaces as a substrate. The curvature induces a lateral film-thickness variation that allows alteration of the properties of the deposited material. Based on this concept, a variety of implementations in materials science can be expected. ...